Growth of transparent conductive ZnO:Al thin film on flexible substrates by DC Magnetron Sputtering

• Main Authors: Yi-Syuan Jhao, 趙乙璇
• Other Authors: Shiyung Chiou
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/21725658768337452319

碩士 === 國立高雄應用科技大學 === 模具工程系碩士班 === 95 === Aluminum-doped zinc oxide (AZO)may be another consideration for depositing conductive and transparent thin film on polyethylene terephalate (PET) or glass in addition to the commonly used ITO films. This study is to deposit the AZO films on PET by controlling process variables such as oxygen flow percentage, working pressure, output watt, deposition time and aluminum percentage in magnetron reactive sputtering system. The X-ray diffraction (XRD) is used to examine the phases of deposited AZO films. The scanning electron microscope (SEM) and transmission electron microscope are taken to investigate the film morphologies and crystallographic orientation. Four-Point Probe is used to measure the sheet resistance of the films. The profile and X-ray diffraction are applied for measuring the film thickness and detecting the transparency of AZO films. The results indicate the pure zinc oxide films of 200nm thickness with 8.2% oxygen flow percentage have the resistivity of 14.5 Ω-cm while the AZO films with 4nm thickness of aluminum films each layer have resistivity of 4.23 Ω-cm, and the sheet resistance change with oxygen flow percentage in pure zinc oxide films and aluminum percentage in AZO films. The pure zinc oxide films with 200nm thickness on PET have higher transparency than that with 400nm thickness, and the more thicker, the less transparency. The AZO films with 4nm thickness of aluminum each layer have the highest transparency in shorter wavelength band while those with 6nm thickness of aluminum each layer have the highest transparency in longer wavelength band. The results of X-ray diffraction (XRD) show the obvious (002) peaks of ZnO in pure zinc oxide films. AZO films have the same microstructure of (002) orientation of ZnO and the intensities change with aluminum percentage. The TEM analyzes the (100), (002) and (101) crystallographic orientations in pure ZnO films and aluminum-doped ZnO films. The observation of SEM shows the morphologies of AZO films with thickness ＞200nm.