Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy

碩士 === 逢甲大學 === 產業研發碩士班 === 95 === The research grows titanium oxide TiO and TiO2 (generally called TiOx) with ultra high vacuum reactive magnetron sputtering titanium target in different O2/Ar flow ratio, and monitors the difference of plasma type with in-situ optical emission spectroscopy (OES) t...

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Main Authors: Chien-Chih Lee, 李健志
Other Authors: G. S. Chen
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/09390942312117818093
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spelling ndltd-TW-095FCU053340092015-10-13T11:31:40Z http://ndltd.ncl.edu.tw/handle/09390942312117818093 Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy 光釋放能譜臨場監控反應性濺鍍超親水氧化鈦薄膜之特性分析 Chien-Chih Lee 李健志 碩士 逢甲大學 產業研發碩士班 95 The research grows titanium oxide TiO and TiO2 (generally called TiOx) with ultra high vacuum reactive magnetron sputtering titanium target in different O2/Ar flow ratio, and monitors the difference of plasma type with in-situ optical emission spectroscopy (OES) to get hysteresis effect of deposited metal thin films, and then separates the division of metal zone, transition zone and poisoned zone by “the intensity of remnant titanium”. After that, use Rutherford backscattering spectroscopy (composition analysis of Ti and O), grazing x-ray diffraction (microstructure analysis) and the data of electric resistivity and deposition rate to understand the characteristic of TiOx in each zone clearly. It is sure that metal Ti and TiO (stoichiometric) thin films with resistivity 101 and 499 μΩ-cm can be grown in 50% poisoned metal zone. The poisoned ratio of the transition zone is 70~80% and there are semi-conductive TiO2 thin films under stoichiometric (TiO1.5, TiO1.66). The poisoned ratio of the poisoned zone is over 95% and there are stoichiometric (TiO2.0) and slightly over stoichiometric thin films (TiO2.2).The thin film deposition rate will increase slightly with oxygen flow ratio rising, and sharply drop to 1/3~1/4 during complete poisoning, about 95%~100%. The change of deposition rate depends on the poisoned degree of titanium target and the difference of molar volume. Finally, grazing x-ray diffraction analysis indicates that TiO1.0 thin films grown in metal zone have apparent poly crystal structure, and oxygen insufficient TiO2 grown in transition zone and stoichiometric TiO2.0 thin film grown in poisoned zone have not great crystalline condition, but the former one will transform to coexisting anatase (A-TiO2) and rutile (R-TiO2) phases, and the latter to A-TiO2 after high temperature annealing in oxygen atmosphere. Water contact angle measurement indicates that the two type of thin films both are photo-induced ultra hydrophilic and the single phase A-TiO2 thin films are better, and their hydrophilic behavior have longer reverse time without light. G. S. Chen 陳錦山 2007 學位論文 ; thesis 111 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 逢甲大學 === 產業研發碩士班 === 95 === The research grows titanium oxide TiO and TiO2 (generally called TiOx) with ultra high vacuum reactive magnetron sputtering titanium target in different O2/Ar flow ratio, and monitors the difference of plasma type with in-situ optical emission spectroscopy (OES) to get hysteresis effect of deposited metal thin films, and then separates the division of metal zone, transition zone and poisoned zone by “the intensity of remnant titanium”. After that, use Rutherford backscattering spectroscopy (composition analysis of Ti and O), grazing x-ray diffraction (microstructure analysis) and the data of electric resistivity and deposition rate to understand the characteristic of TiOx in each zone clearly. It is sure that metal Ti and TiO (stoichiometric) thin films with resistivity 101 and 499 μΩ-cm can be grown in 50% poisoned metal zone. The poisoned ratio of the transition zone is 70~80% and there are semi-conductive TiO2 thin films under stoichiometric (TiO1.5, TiO1.66). The poisoned ratio of the poisoned zone is over 95% and there are stoichiometric (TiO2.0) and slightly over stoichiometric thin films (TiO2.2).The thin film deposition rate will increase slightly with oxygen flow ratio rising, and sharply drop to 1/3~1/4 during complete poisoning, about 95%~100%. The change of deposition rate depends on the poisoned degree of titanium target and the difference of molar volume. Finally, grazing x-ray diffraction analysis indicates that TiO1.0 thin films grown in metal zone have apparent poly crystal structure, and oxygen insufficient TiO2 grown in transition zone and stoichiometric TiO2.0 thin film grown in poisoned zone have not great crystalline condition, but the former one will transform to coexisting anatase (A-TiO2) and rutile (R-TiO2) phases, and the latter to A-TiO2 after high temperature annealing in oxygen atmosphere. Water contact angle measurement indicates that the two type of thin films both are photo-induced ultra hydrophilic and the single phase A-TiO2 thin films are better, and their hydrophilic behavior have longer reverse time without light.
author2 G. S. Chen
author_facet G. S. Chen
Chien-Chih Lee
李健志
author Chien-Chih Lee
李健志
spellingShingle Chien-Chih Lee
李健志
Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy
author_sort Chien-Chih Lee
title Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy
title_short Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy
title_full Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy
title_fullStr Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy
title_full_unstemmed Characterization of Reactively Sputtered Hydrophilic Titanium Oxide Thin Films Monitored In-Situ by Optical Emission Spectroscopy
title_sort characterization of reactively sputtered hydrophilic titanium oxide thin films monitored in-situ by optical emission spectroscopy
publishDate 2007
url http://ndltd.ncl.edu.tw/handle/09390942312117818093
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