Preparation of copper indium disulfide thin films by chemical bath deposition
碩士 === 國立中正大學 === 化學工程所 === 95 === Chemical bath deposition was used to prepare copper indium disulfide thin films and parameters were varied to study the thin film growth process. We used (3-Aminopropyl)triethoxysilane (APS) self-assembled monolayers to modify the glass substrate in this study. I...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/39460702377537914555 |