An Investigation on Hot Carrier Effect at Elevated Temperatures for pMOSFETs of 0.13μm Technology
碩士 === 國立臺北科技大學 === 機電整合研究所 === 94 === On the basis of the physical properties of silicon, the mean free path of holes is about one half of the electrons, and hole’s mobility is about one third of the electrons at the room temperature. Therefore, holes were considered harder to create interface stat...
Main Authors: | Po-Wei Kao, 高柏偉 |
---|---|
Other Authors: | 黃恆盛 |
Format: | Others |
Language: | en_US |
Published: |
2006
|
Online Access: | http://ndltd.ncl.edu.tw/handle/m966fh |
Similar Items
-
DC Hot Carrier Reliability at Elevated Temperatures for nMOSFETs Using 0.13μm Technology
by: Ze-Wei Jhou, et al.
Published: (2005) -
The Switch of the Worst Case on NBTI and HC Reliability of 0.13 μm MOSFETs
by: Meng-Hong Lin, et al.
Published: (2007) -
The Switch of the Worst Case on NBTI and HC Reliability of 0.13 μm MOSFETs
by: Meng-Hong Lin, et al.
Published: (2007) -
Hot-Carrier Effect and Negative Bias Temperature Instability of Narrow-Width pMOSFET's
by: Ming-Jeng Yang, et al.
Published: (2003) -
NBTI-like Hot-Carrier Effect of SOI pMOSFET's with 1.3nm Gate Oxide
by: Shih Cheng Hung, et al.
Published: (2004)