Application of TRIZ Theory on End Point Detection of Chemical Mechanical Polishing
碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 94 === This paper describes the applications of TRIZ (Theory of Inventive Problem Solving) on End Point Detection (EPD) of chemical mechanical polish(CMP) to innovate new EPD methods. The EPD is a very important process during polishing a wafer. Usually, a wafer’s p...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/846e43 |