Application of TRIZ Theory on End Point Detection of Chemical Mechanical Polishing

• Main Authors: MING-YEH LIU, 劉明曄
• Other Authors: MING-TONG TSAI
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/846e43

碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 94 === This paper describes the applications of TRIZ (Theory of Inventive Problem Solving) on End Point Detection (EPD) of chemical mechanical polish(CMP) to innovate new EPD methods. The EPD is a very important process during polishing a wafer. Usually, a wafer’s polished thickness is only a little micro-meter, which is very difficult to control. It must be polished on right position, otherwise a “Dishing” or “Erosion” may be occurred. TRIZ is a creation method. The creator is Mr. Genrich Altshuller. He collected and analyzed about two million’s patent articles to derive a contradictory theory. This covers both technology and physics view. In this thesis, we use this contradictory method to solve the problem on EPD of CMP. Several new EPD methods were developed by using the inventive theory and the contradiction matrix. (48X48). It is hopeful the new methods can be implemented in the field on EPD of CMP or other similar applications in industry.