| Summary: | 碩士 === 國立臺灣師範大學 === 機電科技研究所 === 94 === Abstract
There is an increasing need on fabricating optic films with micro-pattern for optoelectronic devices. Dispersion methods, such as dyeing, pigment and printing, are currently used in preparing color filters for display technology. However, bad thermal stability of manufacturing coating materials is a great challenge for high-luminant displays. In this study, we used photolithography to define the growth of Ni films by electroforming. The Ni films can be used to replace photoresist as mask to selectively deposit optical films by E-gun evaporation. Straight and mosaic patterns are chosen as arrangements of R, B and G color films. The average light transmittances of the color films are larger than 90 %. The experimental results show that the process can be used to fabricate optical films with desired micro-patterning. We have successfully demonstrated the use of photolithography, electroforming and E-gun evaporation technologies to fabricate chemically and thermally stable micro-patterned optical films with high light transmittance, resolution and color purity. Because of good compatibility with IC manufacturing process, our method can be quickly adapted in applications of projector, optical sensor and bio-inspection.
Keywords：color filter, photolithography, electroforming, E-gun evaporation, optical sensor
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