A Novel Fabrication Method of SU-8 Embedded Micro Channels and Its Applications

• Main Authors: Chia-Hung Hung, 洪嘉鴻
• Other Authors: Chien-Chung Fu
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/50237263324699630062

碩士 === 國立清華大學 === 動力機械工程學系 === 94 === SU-8 thick film photoresist is one of the useful materials for fabricating high aspect ratio structures in MEMS applications. In this paper, we present a novel and simple method to fabricate embedded micro channels. The method is based on different light absorption properties of the SU-8 thick photoresist under different incident UV wavelengths during the simple lithography fabrication. This method also can fabricate other complicated three-dimensional micro-structures. Besides, the relationship between the thickness of the top layer and the exposure dose has been measured by an ingeniously designed experiment. Further more, many meaningful mechanical structures have been realized by this method, the material property of the top layer are also measured. The Young’s modulus is about 4.31GPa. We fabricate a ink jet printhead which includes a chamber and nozzle structures by this method. In this paper we will conclude some results (including some structures and measurements) and the problems happened during the experiment process. Then we will discuss and solve the problems (like bending phenomenon produced by the residual stress). Finally we will propose some improvements in the future.