High-quality thin single-crystalline Sc2O3 films grown on Si(111)

碩士 === 國立清華大學 === 材料科學工程學系 === 94 === Sc2O3 films had been found to be epitaxially grown on Si (111) substrate with different thickness. With electron beam evaporated from a high-purity Sc2O3 source in UHV (a molecular beam epitaxy (MBE) approach), we got good crystallinity Sc2O3 film on silicon sub...

Full description

Bibliographic Details
Main Authors: Hsing-Yi CHOU, 周欣儀
Other Authors: M. Hong
Format: Others
Language:en_US
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/28146793937263837249

Similar Items