| Summary: | 碩士 === 國立清華大學 === 材料科學工程學系 === 94 === In this study, we had deposited carbon-related films in a 90̊ -bend magnetic filtered cathodic arc plasma (FCAP) system using CF4 and N2 as gaseous precursors and a graphite cathode target (99.999% pure). X-ray photoelectron spectroscopy (XPS) was used to study the chemical bondings, and the result showed that as CF4 flux increases, all peaks shift to higher binding sides. Besides, the microstructures of the films were investigated using Raman spectroscopy and X-ray diffraction. The thickness and surface morphology of the films were measured by a field emission scanning electron microscope. It showed that the nanoclusters were clearly observed instead of monotonic film growth with the increasing of CF4 content. The surface roughness and morphology of the films were examined by an atomic force microscopy in advance. Finally, the luminescence character was performed by cathodoluminescence spectra and the mechanical properties of the films were detected by a nano-indentation system.
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