Annealing influences on phosphorous ion implanted vicinal Si(111) studied by Reflective Second Harmonic Generation

碩士 === 國立嘉義大學 === 光電暨固態電子研究所 === 94 === Second harmonic generation (SHG) is used to study the annealing effect on the low-energy implanted vicinal Si(111). The phenomena of the impurity diffusion would be observed through the anisotropic contribution of C3V symmetry in the SHG rotational anisotropy...

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Bibliographic Details
Main Author: 黃繹任
Other Authors: 羅光耀
Format: Others
Language:en_US
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/39838780842106554860