Characteristics of (TiO2)x(Ta2O5)1-x composite films prepared by Radio Frequency Ion Beam Sputtering Deposition

• Main Authors: Yung-Chi Wu, 吳永企
• Other Authors: Cheng-Chung Lee
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/62117878190078966233

碩士 === 國立中央大學 === 光電科學研究所 === 94 === Since the coating materials are limited, mixing materials provide the way to solve the limitation. In this study (TiO2)x(Ta2O5)1-x composite films were prepared by radio frequency ion-beam sputtering deposition (RF-IBSD) of Ta and Ti targets . The symbol “x” indicate the composite fraction of TiO2 。The composite films were all amorphous structure. The refractive indices and the extinction coefficients decreased with increase of Ta2O5 in composite films. The refractive indices of composite films ranged from 2.48 to 2.16 at 550-nm wavelength. The holes was observed at surface of pure TiO2 film , the residual stress of which was -0.516 GPa. There were crystals in the pure TiO2 film after annealing at 300℃.When the fraction of Ta2O5 is above 21% in the composite films，the holes observed at surface of pure TiO2 film disappeared, and the residual stress of the composite films decrease to -0.269 GPa; the structure of composite films remained amorphous to 350℃ annealing temperature. The (TiO2)x(Ta2O5)1-x composite films have good thermal stability, and decrease residuals stress and extinction coefficient .