The Research of Obliquely Deposited Films at 193nm
碩士 === 國立中央大學 === 光電科學研究所 === 94 === Obliquely depositing Magnesium fluoride, Lanthanum fluoride, and Gadolinium fluoride for deposition angles in the range 20°–70°. Column angles were determined ex situ from scanning electron microscopy photographs of deposition-plane fractures. Stress was measured...
Main Authors: | Wen-Hao Cho, 卓文浩 |
---|---|
Other Authors: | Cheng-Chung Lee |
Format: | Others |
Language: | zh-TW |
Published: |
2006
|
Online Access: | http://ndltd.ncl.edu.tw/handle/19848580736567563789 |
Similar Items
-
The research of fluoride composite film in DUV at 193nm
by: Chin-Han Lee, et al.
Published: (2006) -
The research of optical thin films in DUV at 193nm
by: Ming-Chung Liu, et al.
Published: (2005) -
photodissociation of trichloroethylene at 193nm by translational spectroscopy
by: Yu-Jinn Lee, et al.
Published: (1996) -
The 193 nm photodissociation of CF2=CHCI
by: 柯宏昇
Published: (2001) -
Superlattice Thin Films for Attenuated Phase-Shifting Mask at 193 nm Wavelength
by: Fu-Der Lai, et al.
Published: (2001)