A Study on the Process Technologies and Characteristics of Novel Tri-Gate FETs and TFTs
博士 === 國立交通大學 === 電子工程系所 === 94 === In this thesis, we studied the process technologies and device characteristics of novel SOI tri-gate FETs (TGFETs) and low-temperature poly-Si TFTs with NiSi films. Including thermal stability of NiSi films on different substrates, the control of lateral silicidat...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/06045907922301898854 |