Microstructural Characterization of the ZrO2/Ti interface between 1100℃ and 1500℃
碩士 === 國立交通大學 === 材料科學與工程系所 === 94 === The objective of this work is to joint ZrO2 to itself using Ti foil. The reaction was at the temperature from 1100℃ to 1500℃ in the atmosphere of argon. The microstructure of the reaction interface were characterized by scanning electron microscopy(SEM)、electro...
Main Authors: | Tsai,Yi-Ting, 蔡宜庭 |
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Other Authors: | Chien-Cheng Lin |
Format: | Others |
Language: | zh-TW |
Published: |
2006
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Online Access: | http://ndltd.ncl.edu.tw/handle/08868319970984455639 |
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