Microstructural Characterization of the ZrO2/Ti interface between 1100℃ and 1500℃

• Main Authors: Tsai,Yi-Ting, 蔡宜庭
• Other Authors: Chien-Cheng Lin
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/08868319970984455639

碩士 === 國立交通大學 === 材料科學與工程系所 === 94 === The objective of this work is to joint ZrO2 to itself using Ti foil. The reaction was at the temperature from 1100℃ to 1500℃ in the atmosphere of argon. The microstructure of the reaction interface were characterized by scanning electron microscopy(SEM)、electron probe microanalyzer (EPMA) and analytical transmission electron microscopy(TEM/EDS). After annealing at 1100℃/36h, the dissolution of a large amount of oxygen into titanium gave rise to α-Ti(O) solid solution. At temperature above 1200℃，the oxygen transport through the interface resulting in the growth of titanium oxide, TiO and Ti2O3.In the zirconia side, t-ZrO2 was found after 1100℃/36h-1400℃/36h annealing, and c-ZrO2 was also found after annealing at 1300℃/36h.