Microstructural Characterization of the ZrO2/Ti interface between 1100℃ and 1500℃

碩士 === 國立交通大學 === 材料科學與工程系所 === 94 === The objective of this work is to joint ZrO2 to itself using Ti foil. The reaction was at the temperature from 1100℃ to 1500℃ in the atmosphere of argon. The microstructure of the reaction interface were characterized by scanning electron microscopy(SEM)、electro...

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Bibliographic Details
Main Authors: Tsai,Yi-Ting, 蔡宜庭
Other Authors: Chien-Cheng Lin
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/08868319970984455639
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Summary:碩士 === 國立交通大學 === 材料科學與工程系所 === 94 === The objective of this work is to joint ZrO2 to itself using Ti foil. The reaction was at the temperature from 1100℃ to 1500℃ in the atmosphere of argon. The microstructure of the reaction interface were characterized by scanning electron microscopy(SEM)、electron probe microanalyzer (EPMA) and analytical transmission electron microscopy(TEM/EDS). After annealing at 1100℃/36h, the dissolution of a large amount of oxygen into titanium gave rise to α-Ti(O) solid solution. At temperature above 1200℃,the oxygen transport through the interface resulting in the growth of titanium oxide, TiO and Ti2O3.In the zirconia side, t-ZrO2 was found after 1100℃/36h-1400℃/36h annealing, and c-ZrO2 was also found after annealing at 1300℃/36h.