The Study of the Laser-assisted Direct Imprinting Fabrication on Semiconductor Thin Films
碩士 === 國立成功大學 === 微機電系統工程研究所 === 94 === The field of nano-technology is advancing rapidly. For high-throughput and low-cost lithography, Nano-imprinting technologies have been developed. Hence, we want to establish parameters for the laser-assisted direct imprinting fabrication on semiconductor th...
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| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/42890892371199605712 |
| Summary: | 碩士 === 國立成功大學 === 微機電系統工程研究所 === 94 === The field of nano-technology is advancing rapidly. For high-throughput and low-cost lithography, Nano-imprinting technologies have been developed. Hence, we want to establish parameters for the laser-assisted direct imprinting fabrication on semiconductor thin films. In our experiment, we found several special structures by accident. These special structures comprise nano-islands、ripples、quasi-regular square array and periodic patterns. Feasible explanations of the laser-induced nano-structures in the surface morphologies of thin films are deduced by controllable variables. The model takes into account the strain effect which is caused by the thickness of the thin film、the lattice mismatch of hetero-structures、the laser irradiation and the imprinting pressure. We have demonstrated surface morphologies of imprinting results by SEM and AFM. Finally, the variations of material structures were also demonstrated with XRD、Raman.
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