Fabrication of the Underwater Acoustic Sensor by using one-step Deep Reactive-Ion Etching process
碩士 === 國立成功大學 === 系統及船舶機電工程學系碩博士班 === 94 === This study reports a novel design of a MEMS type underwater acoustic sensor using 6”single-crystalline silicon wafer. At resonant frequent of the membrane structure , a high signal-to-noise ratio is expected by chemical vapor deposition thin layers of si...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2006
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Online Access: | http://ndltd.ncl.edu.tw/handle/86454585656291712810 |