Tilt growth and surface of Mo nanocrystal

• Main Authors: Chao-Liang Tu, 涂朝亮
• Other Authors: Jung-Chun Huang
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/44141440392639495032

碩士 === 國立成功大學 === 物理學系碩博士班 === 94 === We have investigated the growth of surface nanostructures on a Mo(100)/Al2O3(1-102) film system. The lattice structure and surface morphology will be affected by the 3D lattice match and the tensile relaxation between Mo(100) film and Al2O3(1-102) substrate. Here we use the RHEED diffraction pattern to analyze the characteristic of surface lattice structures and then use X-ray diffraction to analyze the lattice structure, the tilt angle between film and substrate, and the relationship between the film thickness and lattice stress. At last we use STM to observe the morphology and characteristic of the step surface. We take advantage of controlling the parameters such as growth temperature and film thickness under the conditions of 1000°C and 100Å. Finally we successfully obtain the self-assemble nanosteps surface which is with tilt growth. The terraces width of these nanosteps are about 2nm~6nm and it’s obviously a highly density of self-assemble nanosteps.