Study on micro/nano-imprinting lithography techniques and polymeric etching barrier materials for flexible displays application.

• Main Authors: Wen-Chang Liao, 廖文昌
• Other Authors: Steve Lien-Chung Hsu
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/62659317171755693737

博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 94 === Three new processes : (1)pattern transferring technique on flexible substrate (2)high aspect ratio pattern transfer by using hybrid mold and (3)back flash imprint lithography were successfully developed for imprint lithography on flexible substrates. They were developed on the consideration of mold fabrication, polymeric materials and the limitation of the flexible substrates .Four new series resists: (1) low glass transition temperature acrylic resists, (2) acidic acrylic resists, (3) silated acidic acrylic resist and (4)solvent-free thermal initiated resist were also successfully prepared for imprinting lithography on flexible substrates. They are not only compatible to the imprinting lithography on flexible substrates but also environmentally friendly .Acidic moiety in the acidic and silated acidic polymers make the rest of the resist be easily removed by aqueous base solution at the last stripping step in imprint lithography. Micron-scaled large area (4inches) and nano-scaled patterns were also completely transferred by using these three processes and three series of resists. Those developed processes and resists make the pattern transfer on flexible substrates possible and could also efficiently enhance the throughput and quality of the imprinting processes.