Study on micro/nano-imprinting lithography techniques and polymeric etching barrier materials for flexible displays application.

博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 94 === Three new processes : (1)pattern transferring technique on flexible substrate (2)high aspect ratio pattern transfer by using hybrid mold and (3)back flash imprint lithography were successfully developed for imprint lithography on flexible substrates. They w...

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Bibliographic Details
Main Authors: Wen-Chang Liao, 廖文昌
Other Authors: Steve Lien-Chung Hsu
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/62659317171755693737