Oxidation behavior of (Ti,Al)N films at high temperatures under controlled atmosphere
碩士 === 國立中興大學 === 材料工程學系所 === 94 === The object of this research is to investigate oxidation behavior of (Ti,Al)N films annealed in the controlled atmophere. (Ti,Al)N films were reatively sputtered onto Si substrates (100) by cathidic arc ion-plating sputtering deposition. The films were then anneal...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/37537249801584764399 |