| Summary: | 碩士 === 國立中興大學 === 化學系所 === 94 === The study of main cause were included improvement of the process in fabrication of microchip, increased the complete rate of product in the lower class lithography laboratory, and built our own technology and experiences of procedure up without cooperation with other laboratories.
In this study, we made a poly(methyl methacrlate)(PMMA)-based microchip device, integrated with screen-printed three-electrode electrochemical detector, a photoresist layer constitutes both an adhesion layer and side walls of 50 μm wide and 50 μm depth microfluidic channels on a screen-printed three electrode PMMA substrate by coated the negative photoresist(THB-120N, JSR Co. Ltd) on PMMA substrate with spin-coating, and then by exposured with UV lamp(400 nm,60 mW/cm2) for 180s.
Finally, we get good bonded PMMA/photoresist/PMMA microchip with lower temperatur(26 kgf—30 kgf) and pressure(95 ℃—100 ℃) of bonding procedure by coating photoresist on PMMA without three-electrode pattern. Besides that, we tried to detail problem of non-active electrodes on the microchip with oxygen plasma, and study the suitable injector. This system were applied in determination of uric acid and the results were good.
We made the Poly(dimethylsiloxane)(PDMS)/gass microchip by fabricating master on PMMA substrate.
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