Virtual Metrology Technique for Semiconductor Manufacturing

• Main Authors: Tin-Wei Shen, 沈庭偉
• Other Authors: yao-ren zhang
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/31435490116798171493

碩士 === 中原大學 === 機械工程研究所 === 94 === Abstract The semiconductor of our country regards manufacturing as the subject. Under global keen competition, strict process control already become the indispensable demand. It is most important factor of international competitiveness for Panel factory and Liquid Crystal Display(LCD) factory how does it want effective reducing production cost, increasing equipment efficiency, reducing process risk, increasing process yield. Present most of Panel factory and LCD factory use control technology for statistics process control technique to monitor important process parameters. However the result can’t be measure right away, this monitor maybe cause a large number of base plate loss if it happen process unusual. It will influence the production cost and yield seriously. Because of the flourishing development of information technology and internet network technology in recent years, produced the idea about e-Diagnostics and e-Maintenance. Pretext of internet network and information technology to achieve the goal of virtual metrology, diagnose-self and predict maintain. E-Diagnostics technology can diagnose and repair the equipment, shorten repair time and reduce service cost. Idea of virtual metrology is combine e-Diagnostics and advanced process control to achieve the goal of quality predict. The theory combines advanced process control technology and idea of virtual metrology to filter noise by wavelet theory, and using fuzzy neural networks predict trend and recipe influence. Pretext of predict metrology to improve the quality of process, promote equipment efficiency. Absolute error is under 25 and absolute error rate is under 1.5% in simulate data and absolute error is about 0.05 and absolute error rate is about 3.84% in actual data.