The Investigation of Process-structure-property Relationship of Plasma Deposited Fluorocarbon Films Using Design of Experiment and Plasma Diagnostics

博士 === 中原大學 === 化學工程研究所 === 94 === Fluorinated amorphous carbon (a-C:F) films have attracted much attention in the last several decades due to their chemical stability, low surface energy, low refractive index, good electrical and thermal insulation. Plasma polymerization is one of the most popular...

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Bibliographic Details
Main Authors: Chi-Hung Liu, 劉志宏
Other Authors: Ta-Chin Wei
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/26129840425283854403

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