The Investigation of Process-structure-property Relationship of Plasma Deposited Fluorocarbon Films Using Design of Experiment and Plasma Diagnostics
博士 === 中原大學 === 化學工程研究所 === 94 === Fluorinated amorphous carbon (a-C:F) films have attracted much attention in the last several decades due to their chemical stability, low surface energy, low refractive index, good electrical and thermal insulation. Plasma polymerization is one of the most popular...
Main Authors: | Chi-Hung Liu, 劉志宏 |
---|---|
Other Authors: | Ta-Chin Wei |
Format: | Others |
Language: | zh-TW |
Published: |
2005
|
Online Access: | http://ndltd.ncl.edu.tw/handle/26129840425283854403 |
Similar Items
-
Process-structure-property Relationship of 1,1,1,2-tetrafluoroethane Plasma Deposited Fluorocarbon Films with Composite Structures
by: Rong-Jyun Chen, et al.
Published: (2012) -
Preparation of Amorphous Fluorocarbon Films via Pulsed Plasma Enhanced chemical Vapor Deposition
by: Shin-Hsien Yang, et al.
Published: (2005) -
Pulsed plasma enhanced chemical vapor deposition of fluorocarbon thin films for dielectric applications
by: Labelle, Catherine B., 1972-
Published: (2014) -
Low Dielectric Constant Fluorocarbon Films Containing Silicon by Plasma Enhanced Chemical Vapor Deposition
by: Jin, Yoonyoung
Published: (2005) -
Super-amphiphobic Teflon-like Fluorocarbon Nanoflakes Deposited by Microwave Plasmas
by: Wen-Hui Wang, et al.
Published: (2018)