High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric

碩士 === 中華大學 === 電機工程學系碩士班 === 94 === Low-temperature poly-Si (LTPS) thin-film transistors (TFTs) are used for active matrix liquid crystal displays (AMLCDs) on glass substrates. However , a difficult technological challenge is to develop high-performance TFTs that are useful for both pixel and displ...

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Main Authors: Tai-Jui,Wang, 王泰瑞
Other Authors: Ing-Jar,Hsieh
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/34739545082679926059
id ndltd-TW-094CHPI0442032
record_format oai_dc
spelling ndltd-TW-094CHPI04420322015-10-13T10:38:05Z http://ndltd.ncl.edu.tw/handle/34739545082679926059 High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric 以氧化鋁鑭為閘極氧化層製作高性能薄膜電晶體 Tai-Jui,Wang 王泰瑞 碩士 中華大學 電機工程學系碩士班 94 Low-temperature poly-Si (LTPS) thin-film transistors (TFTs) are used for active matrix liquid crystal displays (AMLCDs) on glass substrates. However , a difficult technological challenge is to develop high-performance TFTs that are useful for both pixel and display circuits . Pixel TFTs need to operate at high voltages with low gate-leakage currents, to drive the liquid crystal. In contrast, high-speed display circuits require TFTs to operate at low voltages and high drive currents, with a low threshold voltage(Vth). In this letter, we report high-K LaAlO3 gate dielectric TFTs which show a high breakdown voltage and transistor drive current at 5 V. In addition to the very high-K(~23), the LaAlO3 has good device reliability of low bias-temperature instability among high- CMOS devices. The performance is due to the increase, by a factor of Kdielectric/KSiO2, in the gate capacitance density. This lowers the Vth and improves both the gate-leakage current and breakdown field, since the thickness of the high-K dielectric layer can be increased. Although the high-K Al2O3 TFT was previously reported , the relative lower K of 9–10 and gate capacitance have smaller effect to lower down the Vth. The LaAlO3 TFTs showed a low of 1.2 V, a high gate-dielectric breakdown field of 6.3 MV/cm, low subthreshold swing of 0.31 V/dec, high field-effect mobility of 40 cm /Vs, a large on-off-state drive current ratio(Ion/Ioff)of 1.5×106 and high drive current up to 21 A/ m. The high breakdown voltage and high transistor drive current suggest that the LaAlO3 TFTs can meet the device requirements for both pixel and display circuits. Ing-Jar,Hsieh 謝焸家 2006 學位論文 ; thesis 60 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 中華大學 === 電機工程學系碩士班 === 94 === Low-temperature poly-Si (LTPS) thin-film transistors (TFTs) are used for active matrix liquid crystal displays (AMLCDs) on glass substrates. However , a difficult technological challenge is to develop high-performance TFTs that are useful for both pixel and display circuits . Pixel TFTs need to operate at high voltages with low gate-leakage currents, to drive the liquid crystal. In contrast, high-speed display circuits require TFTs to operate at low voltages and high drive currents, with a low threshold voltage(Vth). In this letter, we report high-K LaAlO3 gate dielectric TFTs which show a high breakdown voltage and transistor drive current at 5 V. In addition to the very high-K(~23), the LaAlO3 has good device reliability of low bias-temperature instability among high- CMOS devices. The performance is due to the increase, by a factor of Kdielectric/KSiO2, in the gate capacitance density. This lowers the Vth and improves both the gate-leakage current and breakdown field, since the thickness of the high-K dielectric layer can be increased. Although the high-K Al2O3 TFT was previously reported , the relative lower K of 9–10 and gate capacitance have smaller effect to lower down the Vth. The LaAlO3 TFTs showed a low of 1.2 V, a high gate-dielectric breakdown field of 6.3 MV/cm, low subthreshold swing of 0.31 V/dec, high field-effect mobility of 40 cm /Vs, a large on-off-state drive current ratio(Ion/Ioff)of 1.5×106 and high drive current up to 21 A/ m. The high breakdown voltage and high transistor drive current suggest that the LaAlO3 TFTs can meet the device requirements for both pixel and display circuits.
author2 Ing-Jar,Hsieh
author_facet Ing-Jar,Hsieh
Tai-Jui,Wang
王泰瑞
author Tai-Jui,Wang
王泰瑞
spellingShingle Tai-Jui,Wang
王泰瑞
High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric
author_sort Tai-Jui,Wang
title High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric
title_short High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric
title_full High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric
title_fullStr High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric
title_full_unstemmed High-Performance Poly-Silicon TFTs Using LaAlO3 as the Gate Dielectric
title_sort high-performance poly-silicon tfts using laalo3 as the gate dielectric
publishDate 2006
url http://ndltd.ncl.edu.tw/handle/34739545082679926059
work_keys_str_mv AT taijuiwang highperformancepolysilicontftsusinglaalo3asthegatedielectric
AT wángtàiruì highperformancepolysilicontftsusinglaalo3asthegatedielectric
AT taijuiwang yǐyǎnghuàlǚlànwèizhájíyǎnghuàcéngzhìzuògāoxìngnéngbáomódiànjīngtǐ
AT wángtàiruì yǐyǎnghuàlǚlànwèizhájíyǎnghuàcéngzhìzuògāoxìngnéngbáomódiànjīngtǐ
_version_ 1716831319687692288