The process and application analysis of the deposition of TiAl functionally graded material by co-sputtering
碩士 === 國立雲林科技大學 === 機械工程系碩士班 === 93 === The research is to co-sputter Ti and Al with different deposition rate into a single layer and a multi-layer functional graded material (FGM) by using a PVD-DC/RF magnetron co-sputtering machine. This FGM is intended to be between a Ti layer and an Al layer. E...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/17066800180958469390 |