Study on Possibility and Characteristics of ADI Treated by Low-Temperature Coating Processes

博士 === 大同大學 === 材料工程學系(所) === 93 === In this study, both ENi (Electroless nickel) and CAD (Cathodic arc deposition) surface technologies were used to coat ENi, DLC, TiN and TiAlN films on the surface of ADI substrate for evaluating the possibility about surface modification of ADI. Furthermore, vari...

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Bibliographic Details
Main Authors: Jung-Kai Lu, 呂榕凱
Other Authors: Cheng-Hsun Hsu
Format: Others
Language:en_US
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/84779218817650642352