Formation mechanism and topography of ripple of gold thin coatings deposited on Polydimethylsiloxane

• Main Authors: YU-XIU LI, 李育修
• Other Authors: Ching-Bin Lin
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/62135055536935584207

碩士 === 淡江大學 === 機械與機電工程學系碩士班 === 93 === The study has been developed successfully a process to manufacture the ripple structure with large area. The polydimethylsiloxane(PDMS) films were fixed under 5% tensile strain that were coated with gold, and then released the tensile strain. The ripple structure was formed on the surface of the PDMS film. By means of atomic force microscope observing, the minimum dimension of wavelength and the amplitude on the ripple structure with 508nm and 37.5nm, respectively, and the mean surface roughness(Ra) was all under 5nm. This study also probed into the effect of Young''s modulus of PDMS, time of sputtering deposition gold and thickness of PDMS’s film on the wavelength, the amplitude and defect of the ripple structure. The wavelength and amplitude of the ripple structure decreased with increasing Young''s modulus, increased with increasing time of sputtering deposition and thickness of PDMS film. But the thick gold film debonded and departed easily from the surface of PDMS film. During the history of the ripple structure was formed, three types of the defect easily happened in the ripple structure. (1) oriented surface crack; (2) dislocation-like; (3) crack, which the dimension of defect increased with increasing the wavelength of ripple structure.