Synthesis of composite filmsfor graphite protection using chemical vapor deposition technique
碩士 === 國立臺灣科技大學 === 化學工程系 === 93 === The purpose of this research is to grow silicon carbide/silicon nitride composite films using TMS (tetramethylsilane), ammonia and hydrogen as the reactant gases by chemical vapor deposition. The reactant feed ratio of TMS/NH3 were varied from 0.75 to 24,the com...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/23213778464511869860 |