| Summary: | 碩士 === 國立臺灣大學 === 機械工程學研究所 === 93 === How to fabricate microneedle array is the purpose of the research,. There are two kinds of microneedle array that we can find, one is in-plan microneedle arrays and another is out-of-plan microneedle arrays. In the early almost people focus on in-plan microneedle. Because we need smaller chips and to improve probability of getting blood, now people pay more attention on the application and research of out-of plan microneedle arrays. Using dry etching to fabricate out-of-plan micronedle arryas is the purpose of this research. Using this way can save time and escape unnecessary dangerous. In general people use wet etching to fabricate microneedle arrays. Isotropic etching liquid is HNA which include HF. HF is the most dangerous sour in chemical. Almost material can’t resist HF. So if we use HNA to fabricated microneedle array, we should be more carefully. In order to improve this problem, we use inductively couple plasma (ICP) to complete isotropic etching in this research. And we can try to collocate anisotropic etching to fabricated microneedle arrays that save more space and more height. After fabricating, we should measure the strength of microneedle arrays. This will be helpful to Integrate bio-chip.
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