Surface acoustic wave sensor for detecting amine vapors and removal of photoresist residue using supercritical fluids

Surface acoustic wave sensor for detecting amine vapors and removal of photoresist residue using supercritical fluids

碩士 === 國立清華大學 === 微機電工程研究所 === 93 ===

Bibliographic Details
Main Authors:	Chu Chun Tai, 戴竹君
Other Authors:	Yong-Chien Ling
Format:	Others
Language:	zh-TW
Published:	2005
Online Access:	http://ndltd.ncl.edu.tw/handle/71193385418297206805

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