Maze Routing with OPC Consideration
碩士 === 國立清華大學 === 資訊工程學系 === 93 === As the technology of manufacturing process continues to advance, the process variation becomes more and more serious in nanometer designs. Optical proximity correction (OPC) is employed to correct the process variation of the diffraction effect. To obtain the desi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/97268881509150891149 |