The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications

碩士 === 國立清華大學 === 材料科學工程學系 === 93 ===

Bibliographic Details
Main Author:	姚富淵
Other Authors:	甘炯耀
Format:	Others
Language:	zh-TW
Published:	2005
Online Access:	http://ndltd.ncl.edu.tw/handle/70217489808515271799

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spelling	ndltd-TW-093NTHU51590592016-06-06T04:11:34Z http://ndltd.ncl.edu.tw/handle/70217489808515271799 The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications 應用於高介電閘極氧化層之Y1-XAlXO3(X=0∼0.58)薄膜特性探討姚富淵碩士國立清華大學材料科學工程學系 93 甘炯耀 2005 學位論文 ; thesis 0 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立清華大學 === 材料科學工程學系 === 93 ===
author2	甘炯耀
author_facet	甘炯耀姚富淵
author	姚富淵
spellingShingle	姚富淵 The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications
author_sort	姚富淵
title	The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications
title_short	The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications
title_full	The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications
title_fullStr	The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications
title_full_unstemmed	The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications
title_sort	characteristics of y1-xa1xo3(x=0~0.58)thin films for high-k gate dielectric applications
publishDate	2005
url	http://ndltd.ncl.edu.tw/handle/70217489808515271799
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The characteristics of Y1-xA1xO3(x=0~0.58)thin films for high-k gate dielectric applications

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