Development of self-built multilayer aligner for imprint process

• Main Authors: Lun-hong Cheng, 鄭儒鴻
• Other Authors: Cheng-Tang Pan
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/19641154487636312691

碩士 === 國立中山大學 === 機械與機電工程學系研究所 === 93 === In this paper, a new method combining imprint lithography and multiimprint was discussed to improve the generic TFT process. In order to apply the multilayer imprint, the alignment machine is essential for the whole process. Although there are many types of equipment available on the market, the cost of those alignment apparatuses is too expensive. In this paper, a simple theorem is employed to complete a low cost alignment machine with alignment accuracy to 5 μm. Besides, in order to develop new TFT imprint photoresist, three kind of materials, AZ-series photoresist (AZ-650 a positive photoresist), HOSP (Hygrido Organic Siloxane Polymer) and SE-812, are tested for imprint and evaluate the applications of these materials in the future. The AZ-650 suits imprint process in this experiment.