The Luminescence Properties of ZnO Thin Films Prepared by Room Temperature Sputtering Process
碩士 === 國立中山大學 === 電機工程學系研究所 === 93 === In this study, the reactive rf magnetron sputtering was used to deposit zinc oxide (ZnO) thin films on SiO2/Si substrate at room temperature. The thermal treatment procedure was carried out to improve the luminescence characteristics of ZnO thin films. The phys...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/46186916480842228852 |