Preparation of macro trenches on Si(100) by photo-electrochemical etching in ammonium fluoride solution
碩士 === 國立中央大學 === 機械工程研究所 === 93 === Abstract Formation of macro-trench on n-type silicon in the ammonium fluoride solution by photo-electrochemical etching has been investigated in this work. Effect of applied voltage, the temperature of ammonium fluoride electrolyte, the depth of pre-etching and...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/44682160995210779849 |