An Imaging Polarimetric Technique for Measuring both the Thickness and Optic-axis of a Uniaxial Film
碩士 === 國立交通大學 === 光電工程系所 === 93 === An imaging polarimetry and data acquisition procedures are designed for determining two-dimensional distributions of the thickness and optical axis of an optical uniaxial film. Our design combines an imaging polarimeter with rotation sample scheme and can be emplo...
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/62062404146130459225 |
| Summary: | 碩士 === 國立交通大學 === 光電工程系所 === 93 === An imaging polarimetry and data acquisition procedures are designed for determining two-dimensional distributions of the thickness and optical axis of an optical uniaxial film. Our design combines an imaging polarimeter with rotation sample scheme and can be employed for monitoring film thickness from 1 um to mm with an in-plane spatial resolution better than 100 um. We successfully demonstrate the functionality with a 1-mm thick stoichiometric LiNbO3 wafer, 4.9-um thick liquid crystal device and 10-um thick spatial light modulator (SLM).The LC director’s orientation of Néel wall with and without a point defect have been observed and discussed.The behavior of a Néel wall under applied electric field have been observed and discussed.
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