The Study and Improvement of Chemical Mechanical Planarization and Etching Process Induced Lithography Overlay Error Variation
碩士 === 國立交通大學 === 電機資訊學院碩士在職專班 === 93 === Lithography is the key step of IC manufacturing and directly influences the limit of critical dimension (CD).The lithography is to transfer the pattern on mask to wafer in right position, through alignment and exposure. The pattern misplacement between the l...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/56541436860659073618 |