A Unified Simulation of ElectronTransmission through the Schottky Barrier

碩士 === 國立交通大學 === 電機資訊學院碩士在職專班 === 93 === A numerical simulation program has been developed in this work to investigate the transmission of electrons through the metal-semiconductor contacts. The semiconductor surface is discretized properly into a number of small intervals and the potential barrier...

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Main Authors: Wei-Tsung, Lai, 賴韋仲
Other Authors: Shuang-Fa Guo
Format: Others
Language:en_US
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/67512818224663328158
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spelling ndltd-TW-093NCTU54460212016-06-06T04:10:45Z http://ndltd.ncl.edu.tw/handle/67512818224663328158 A Unified Simulation of ElectronTransmission through the Schottky Barrier 電子穿越肖基障之一致化模擬 Wei-Tsung, Lai 賴韋仲 碩士 國立交通大學 電機資訊學院碩士在職專班 93 A numerical simulation program has been developed in this work to investigate the transmission of electrons through the metal-semiconductor contacts. The semiconductor surface is discretized properly into a number of small intervals and the potential barrier is approximated as a series of piece-wise linear or step functions. The transfer matrix for electron transmission through or cross each interval of simple potential distribution can be obtained by solving the Schrödinger equation using Airy or exponential function. The transmission coefficient of electrons through or across the whole contact barrier is then derived from the cascaded transfer matrices. As a comparison, the conventional WKB approximation method has also been illustrated. Since the transmission coefficient can be calculated numerically for electron with energy below or above the contact barrier, we propose, for the first time, a unified simulation for electron tunneling through the semiconductor surface and thermionic-emission at the metal-semiconductor interface. The thermionic-emission current across the Schottky barrier is integrated from the transmission coefficient, which is a function of electron energy together with the transition probability of electron between metal and semiconductor. However, the tunneling current through the Schottky barrier is converted into a local generation or recombination process with local rate depending on the local Fermi-level and the potential distribution. The tunneling processes are self-consistently treated with all current transport in the semiconductor. The transmission coefficient is a function of electron energy as well as the tunneling and thermionic-emission currents as a function of applied voltage for different transmission models and various doping concentrations has been discussed in this paper. Shuang-Fa Guo 郭雙發 2005 學位論文 ; thesis 50 en_US
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description 碩士 === 國立交通大學 === 電機資訊學院碩士在職專班 === 93 === A numerical simulation program has been developed in this work to investigate the transmission of electrons through the metal-semiconductor contacts. The semiconductor surface is discretized properly into a number of small intervals and the potential barrier is approximated as a series of piece-wise linear or step functions. The transfer matrix for electron transmission through or cross each interval of simple potential distribution can be obtained by solving the Schrödinger equation using Airy or exponential function. The transmission coefficient of electrons through or across the whole contact barrier is then derived from the cascaded transfer matrices. As a comparison, the conventional WKB approximation method has also been illustrated. Since the transmission coefficient can be calculated numerically for electron with energy below or above the contact barrier, we propose, for the first time, a unified simulation for electron tunneling through the semiconductor surface and thermionic-emission at the metal-semiconductor interface. The thermionic-emission current across the Schottky barrier is integrated from the transmission coefficient, which is a function of electron energy together with the transition probability of electron between metal and semiconductor. However, the tunneling current through the Schottky barrier is converted into a local generation or recombination process with local rate depending on the local Fermi-level and the potential distribution. The tunneling processes are self-consistently treated with all current transport in the semiconductor. The transmission coefficient is a function of electron energy as well as the tunneling and thermionic-emission currents as a function of applied voltage for different transmission models and various doping concentrations has been discussed in this paper.
author2 Shuang-Fa Guo
author_facet Shuang-Fa Guo
Wei-Tsung, Lai
賴韋仲
author Wei-Tsung, Lai
賴韋仲
spellingShingle Wei-Tsung, Lai
賴韋仲
A Unified Simulation of ElectronTransmission through the Schottky Barrier
author_sort Wei-Tsung, Lai
title A Unified Simulation of ElectronTransmission through the Schottky Barrier
title_short A Unified Simulation of ElectronTransmission through the Schottky Barrier
title_full A Unified Simulation of ElectronTransmission through the Schottky Barrier
title_fullStr A Unified Simulation of ElectronTransmission through the Schottky Barrier
title_full_unstemmed A Unified Simulation of ElectronTransmission through the Schottky Barrier
title_sort unified simulation of electrontransmission through the schottky barrier
publishDate 2005
url http://ndltd.ncl.edu.tw/handle/67512818224663328158
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