| Summary: | 碩士 === 國立交通大學 === 電子工程系所 === 93 === In recent years, sputter-deposited Al-doped ZnO (AZO) is an interesting transparent conducting oxide (TCO) material for application in optoelectronic devices. In this thesis, the physical, electrical, and optical properties of the AZO films prepared by the RF magnetron sputtering on glass substrates at variable working pressure, deposition power, substrate temperature, and Al dopant content had been investigated using the four-point probe technique, optical transmittance measurements, X-ray diffraction analysis, and scanning electron microscopy. The quality of the AZO films prepared by the RF magnetron sputtering can be well improved by optimizing the deposition parameters. Hence, it seems that the sputter-deposited AZO is a promising TCO material for optoelectronic applications.
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