Investigation of Reliability Issues in a Nitride-Based Localized Charge Storage Flash Memory Cell

博士 === 國立交通大學 === 電子工程系所 === 93 === Reliability issues in a trapping nitride, localized charge storage flash memory cell are comprehensively investigated in this dissertation. Though the use of a thick bottom oxide and trapping storage concept provides excellent intrinsic charge retention, data loss...

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Bibliographic Details
Main Authors: Tsai, Wen-Jer, 蔡文哲
Other Authors: Wang, Tahui
Format: Others
Language:en_US
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/m48b7b

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