The Influence of Si Oxidation due to Thin Ge Layers

碩士 === 國立交通大學 === 物理研究所 === 93 ===

Bibliographic Details
Main Author: 張君黛
Other Authors: Deng-Sung Lin
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/03680268523791237925
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spelling ndltd-TW-093NCTU51980092016-06-06T04:10:45Z http://ndltd.ncl.edu.tw/handle/03680268523791237925 The Influence of Si Oxidation due to Thin Ge Layers 超薄鍺對於氧化矽成長初期的影響 張君黛 碩士 國立交通大學 物理研究所 93 Deng-Sung Lin 林登松 2005 學位論文 ; thesis 57 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 物理研究所 === 93 ===
author2 Deng-Sung Lin
author_facet Deng-Sung Lin
張君黛
author 張君黛
spellingShingle 張君黛
The Influence of Si Oxidation due to Thin Ge Layers
author_sort 張君黛
title The Influence of Si Oxidation due to Thin Ge Layers
title_short The Influence of Si Oxidation due to Thin Ge Layers
title_full The Influence of Si Oxidation due to Thin Ge Layers
title_fullStr The Influence of Si Oxidation due to Thin Ge Layers
title_full_unstemmed The Influence of Si Oxidation due to Thin Ge Layers
title_sort influence of si oxidation due to thin ge layers
publishDate 2005
url http://ndltd.ncl.edu.tw/handle/03680268523791237925
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AT zhāngjūndài chāobáoduǒduìyúyǎnghuàxìchéngzhǎngchūqīdeyǐngxiǎng
AT zhāngjūndài influenceofsioxidationduetothingelayers
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