Parametric Investigation of Laser-Assisted Direct Imprinting (LADI) Technology for Periodic Structures
碩士 === 國立成功大學 === 微機電系統工程研究所 === 93 === As the rapid development of semiconductor technology, the feature size which is smaller than 100nm has reached its limitation. At the present exposure wavelength, ArF （193nm in wavelength）, optical photolithography technique with several resolution- enhancemen...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/98108745006212572528 |