The Study of Low Temperature Oxidation on the Commercial Crystalline Silicon Solar Cell

• Main Authors: Yu-Chieh Fang, 方毓傑
• Other Authors: Shoou-Jinn Chang
• Format: Others
• Language: en_US
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/82670080382222037436

碩士 === 國立成功大學 === 光電科學與工程研究所 === 93 === 　　In this thesis, we use the improved method on oxidation. We use D2 lamp and photo-CVD chamber to advance oxidation at lower temperature (<500℃) and use screen-printing technique to produce solar cells. 　　We mainly discuss the quality of SiO2 at different temperatures. We use AFM to measure the roughness of surface, FTIR spectrum to analyze the bonding of elements and C-V measurements to calculate Dit to observe the interfacial quality. Finally, we combine SiO2 with SiNx deposited by PECVD to measure the optical characteristics such as reflectance and refractive index. We also apply it to solar cell fabrication. 　　We find this double layer antireflection coatings can improve the absorption of photons and have better interfacial quality. The measurements of short circuit current also show the same effect and we can use this photo-assist oxidation to reduce the thermal budget compared to common thermal oxidation.