Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA.

碩士 === 國立成功大學 === 機械工程學系專班 === 93 ===   The ion implantation method is a physics technology capable of creating a highly diffuse inner coating on metallic surfaces. The technology of metal vapor vacuum arc on the other hand is the reaction of pure metallic ions in a gaseous state with special gas mo...

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Main Authors: Jer-Ming Ling, 凌哲明
Other Authors: Hwa-Teng Lee
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/20583197971961020557
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spelling ndltd-TW-093NCKU54900942017-06-04T04:40:15Z http://ndltd.ncl.edu.tw/handle/20583197971961020557 Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA. 用MeVVA方法佈植二氧化鈦光觸媒於玻璃表面上之研究 Jer-Ming Ling 凌哲明 碩士 國立成功大學 機械工程學系專班 93   The ion implantation method is a physics technology capable of creating a highly diffuse inner coating on metallic surfaces. The technology of metal vapor vacuum arc on the other hand is the reaction of pure metallic ions in a gaseous state with special gas molecules in a reactor vessel followed by negative impulse bias attack. These two surface enhancement technologies are capable of creating treatment surface depths up to several hundred nanometers depth. This research postulates the utilization of metal vapor vacuum arc technology to effect enhancement of sodium glass surfaces while making use of titanium ions to speed the attack of oxygen molecules thereby implanting a photo catalyst formation on the glass surface.   Laboratory experiments have shown that after surface treatments are effected by metal vapor vacuum arc technologies then oxidation ability is from 15~20% when tested by argon based blue; testing by UV/VIS shows permeability is reduced by 40%, while at the same time germ levels are solidified into masses thereby enhancing germ resistance. Another aspect is pressure crack test shows photo-catalyst are implanted at depth of 150~200nm and so testing by GIXRD results in no findings.   Metal vapor vacuum arc ion implantation technology is a new “dry” process method of which optimized parameters include low temperature, coatless and pollution free, and so this is an environmentally friendly technology. This process of this research, namely photo catalyst implantation, obviously shows the power of dissolving organic elements while reaching a “clean” state; in addition, reduced permeability results in surface luster while at the same time germ levels are reduced. This method may be used on either car or building glass windows for assessment. I hope to do even further focused research in the future in the hope that resultant formations will be even better controlled. Hwa-Teng Lee 李驊登 2005 學位論文 ; thesis 79 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 國立成功大學 === 機械工程學系專班 === 93 ===   The ion implantation method is a physics technology capable of creating a highly diffuse inner coating on metallic surfaces. The technology of metal vapor vacuum arc on the other hand is the reaction of pure metallic ions in a gaseous state with special gas molecules in a reactor vessel followed by negative impulse bias attack. These two surface enhancement technologies are capable of creating treatment surface depths up to several hundred nanometers depth. This research postulates the utilization of metal vapor vacuum arc technology to effect enhancement of sodium glass surfaces while making use of titanium ions to speed the attack of oxygen molecules thereby implanting a photo catalyst formation on the glass surface.   Laboratory experiments have shown that after surface treatments are effected by metal vapor vacuum arc technologies then oxidation ability is from 15~20% when tested by argon based blue; testing by UV/VIS shows permeability is reduced by 40%, while at the same time germ levels are solidified into masses thereby enhancing germ resistance. Another aspect is pressure crack test shows photo-catalyst are implanted at depth of 150~200nm and so testing by GIXRD results in no findings.   Metal vapor vacuum arc ion implantation technology is a new “dry” process method of which optimized parameters include low temperature, coatless and pollution free, and so this is an environmentally friendly technology. This process of this research, namely photo catalyst implantation, obviously shows the power of dissolving organic elements while reaching a “clean” state; in addition, reduced permeability results in surface luster while at the same time germ levels are reduced. This method may be used on either car or building glass windows for assessment. I hope to do even further focused research in the future in the hope that resultant formations will be even better controlled.
author2 Hwa-Teng Lee
author_facet Hwa-Teng Lee
Jer-Ming Ling
凌哲明
author Jer-Ming Ling
凌哲明
spellingShingle Jer-Ming Ling
凌哲明
Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA.
author_sort Jer-Ming Ling
title Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA.
title_short Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA.
title_full Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA.
title_fullStr Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA.
title_full_unstemmed Study implantation of the photo-catalyst of titanium oxide on glass surface with MeVVA.
title_sort study implantation of the photo-catalyst of titanium oxide on glass surface with mevva.
publishDate 2005
url http://ndltd.ncl.edu.tw/handle/20583197971961020557
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