Positioning of Single or Arrays of Carbon Nanotubes Growth

• Main Authors: Chuan-Po Wang, 王譔博
• Other Authors: Chie Gau
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/17237080702427460647

碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 93 === 　　In this paper we provided a simple fabrication process to overcome the limit of the optical lithography and achieve nano-scale lithography. This process can make a nano-scale pattern like Electron-beam Lithography (EBL) or Nanoimprinting Lithography (NIL) does, but at much lower fabrication cost. 　　This process is described as follows: fist, micro-scale circle array pattern was made on photoresist by using conventional g-line optical lithography. Then, thermal reflow process was adopted to reduce the size of the circle array to nano-scale. Different reflow temperatures and resist thickness were made to achieve a much smaller size of circle array which can be used to produce nanopartile array at desired locations. In the reflow process, the size of circle array can be reduced to less than 100 nm if proper thickness of resist and reflow temperature were selected. The reflow temperature varies from 160 t0 190oC and the thickness of the photoresist varies from 7 to 12μm. Finally, a thin film of Nikel was deposited on the patterned resist, and lift-off process was used to form anoparticles for growth of Carbon Nanotubes (CNTs). 　　Using the method presented in this thesis, CNTs or other nano structures can be grown at desired locations, or the density of CNTs or other nano structures can be properly controlled.