Microstructure & Characteristics of Titanium or Cobalt-doped Zinc Oxide Thin Films

• Main Authors: Kin-Weng Wang, 汪建榮
• Other Authors: Chuan-Pu Liu
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/95045462986494954733

碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 93 === 　　There are two major subjects in this thesis. The first part is mention about “ZnO:Ti thin films deposited by dual gun magnetron sputtering system”. And the second part is “ZnO:Co thin films deposited by dual gun magnetron sputtering system”. Part I: 　　ZnO:Ti thin films were deposited on micro slide glass with dual target (ZnO and TiO2) magnetron sputtering system. The electrical and optical properties of the films can be improve by well control of the sputtering condition. With XRD, SEM and TEM analysis, ZnO:Ti thin films show wurzite structure with (002) prefer orientation. Neither titanium nor titanium oxide phase were found. Transparencies above 85% were measured under visible light using UV-VIS spectrophotometer. Experimental results indicated that reisitivity was 2.7×10-2Ωcm when the films deposited under working pressure with 20mtorr. As a results, the experiments show that the electrical and optical properties of the ZnO:Ti thin films were effected by process parameter and Ti content. Part II: 　　ZnO:Ti thin films were deposited on Si-wafer with dual target (ZnO and Co) magnetron sputtering system. With XRD, ESCA and SEM analysis, ZnO:Co thin films show wurzite structure with (002) prefer orientation. ZnCo2O4 and Co second phase were found when Cobalt content was above the solubility of the films. Beside, dilute magnetic semiconductor (DMS) can be observed with Tc above room temperature, magnetization was 10-6 emu. In our experiments, electrical properties can be improved by induced Hydrogen gas in our sputtering system.