Anodic oxidation of bulk and thin film aluminum
碩士 === 國立中興大學 === 材料工程學研究所 === 93 === In this investigation, the porous anodic oxidation aluminum films were prepared by electrochemical method. These films were prepared on the high pure bulk aluminum and aluminum thin film (Al/TiN/Si) by using 40 V DC potentiostatic mode in 0.3 M oxalic acid elect...
Main Authors: | Wen-Lun, Yen, 顏偉倫 |
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Other Authors: | Fu-Hsing, Lu |
Format: | Others |
Language: | zh-TW |
Published: |
2005
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Online Access: | http://ndltd.ncl.edu.tw/handle/13206896401345524708 |
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